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一、产品概述：

1、 Product overview:

分子束外延（MBE）法是生产砷化镓外延片的方法之一，该法可制出多元、多层、同质、异质、超晶格和量子阱等结构的外延材料。晶体纯度高，化学稳定性好。

Molecular beam epitaxy (MBE) is one of the methods to produce GaAs epitaxial wafers, which can produce multi-component, multi-layer, homogeneous, heterogeneous, superlattice and quantum well epitaxial materials. The crystal has high purity and good chemical stability.

二、主要特点：

2、 Main features:

1. 可制作大规格坩埚（最大直径12inch，最大高度17inch）；

1. It can make large-scale crucible (maximum diameter 12inch, maximum height 17inch);

2. 密度高（最高可达2.2g/cm3）；

2. High density (up to 2.2g/cm3);

3. 纯度高（>99.99%）；

3. High purity (> 99.99%);

4.不易开裂（层间强度高）。

4. Not easy to crack (high interlaminar strength).

三、产品应用

3、 Product application

主要用于MBE法合成半导体单晶及Ⅲ-Ⅴ族化合物。

It is mainly used in the synthesis of semiconductor single crystals and Ⅲ - Ⅴ compounds by MBE method.

Warm tips: Kaifa products are only used for scientific research, not for human body,different batches of products have different specifications and performance.The website pictures are from the Internet. The pictures are for reference only. Please take the real object as the standard. In case of infringement, please contact us to delete them immediately.

Quality AssuranceHigh standards of the industry-leading

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