Features: High purity silicon si single crystal substrate, N / P type optional, resistivity 0.0001-100 ohm, optional

Growth mode: straight pull

Crystal orientation: [111] / [100]

Flatness: <1 micron (measure the overall warpage)

Uses: 1. PVD / CVD coating as substrate

       2. Used as XRD (X-ray diffraction analysis), SEM (scanning electron microscope), FTIR infrared, fluorescence spectrum analysis test substrate, AFM (atomic force microscope)

       3. Sample carrier for synchrotron radiation experiment

       4. The substrate for molecular beam epitaxial growth

       5. Semiconductor lithography process, etc.

Remarks: Other sizes can be customized and invoiced.

Warm tips: Kaifa products are only used for scientific research, not for human body,different batches of products have different specifications and performance.The website pictures are from the Internet. The pictures are for reference only. Please take the real object as the standard. In case of infringement, please contact us to delete them immediately.

Quality AssuranceHigh standards of the industry-leading

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